Surface morphology and structure of epitaxial yttrium on niobium buffer layers with different orientations

Citation
B. Krause et K. Theis-brohl, Surface morphology and structure of epitaxial yttrium on niobium buffer layers with different orientations, J PHYS-COND, 12(22), 2000, pp. 4675-4686
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS-CONDENSED MATTER
ISSN journal
09538984 → ACNP
Volume
12
Issue
22
Year of publication
2000
Pages
4675 - 4686
Database
ISI
SICI code
0953-8984(20000605)12:22<4675:SMASOE>2.0.ZU;2-M
Abstract
We report temperature- and substrate-dependent growth studies of epitaxial yttrium films. Using three different sapphire orientations and Nb buffers, Y was grown in the (0001), (<10(1)over bar 1>) and (<10(1)over bar 2>) crys tal orientations. Atomic force microscopy and x-ray measurements were used to study the topography and structural properties of the samples. Whereas t he Y(0001) films show a high crystallinity and a small surface roughness, Y (<10(1)over bar 1>) and Y(<10(1)over bar 2>) films have regularly structure d surfaces with a lower crystalline quality. Temperature and thickness stud ies show a strong dependence of the surface morphology on growth temperatur e and film thickness.