X-ray diffraction pattern simulation for thermally treated [Zn-Al-Cl] layered double hydroxide

Citation
A. Ennadi et al., X-ray diffraction pattern simulation for thermally treated [Zn-Al-Cl] layered double hydroxide, J SOL ST CH, 152(2), 2000, pp. 568-572
Citations number
23
Categorie Soggetti
Inorganic & Nuclear Chemistry
Journal title
JOURNAL OF SOLID STATE CHEMISTRY
ISSN journal
00224596 → ACNP
Volume
152
Issue
2
Year of publication
2000
Pages
568 - 572
Database
ISI
SICI code
0022-4596(200007)152:2<568:XDPSFT>2.0.ZU;2-#
Abstract
Thermal analyses and X-ray diffraction (XRD) were combined with refinement and simulation of the XRD patterns in order to elucidate the evolution of t he atom distribution in the interlayer domain of the [Zn-Al-Cl] layered dou ble hydroxide during heating, Rietveld refinement indicates that the struct ure is composed of [Zn1-xAlx(OH)(2)](0.33+) layers separated by water molec ules and chloride ions. Zn and Al are randomly distributed among the octahe dral positions. The OH layer sequence is -BC-CA-AB-BC-. Oxygen of water mol ecules and chloride ions, also randomly distributed, prefer positions at ab out 0.76 Angstrom of the threefold axis, The simulation of the XRD patterns shows that these positions were imposed by geometric constraints of water molecules connecting two OH groups of adjacent brucite-like layers. (C) 200 0 Academic Press.