Characteristics of ZnO : Zn phosphor thin films by post-deposition annealing

Citation
W. Li et al., Characteristics of ZnO : Zn phosphor thin films by post-deposition annealing, NUCL INST B, 169, 2000, pp. 59-63
Citations number
12
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
169
Year of publication
2000
Pages
59 - 63
Database
ISI
SICI code
0168-583X(200006)169:<59:COZ:ZP>2.0.ZU;2-O
Abstract
ZnO:Zn phosphor thin films were prepared by ion beam assisted deposition (I BAD). Post-deposition annealing of these films was performed at temperature from 100 degrees C to 1000 degrees C in N-2 and air, respectively. Several analysis techniques were employed to characterize their composition, struc ture and photoluminescence. Two different bands of luminescent peaks, which are UV/violet (380-420 nm) and blue/green (470-530 nm) luminescence, were found in the PL spectra of these films. The results show that the intensity of the blue/green light is strongly affected by the temperature of anneali ng which may result from the recovery of structural defects, the homogeniza tion and the evaporation of excess Zn. However, the contributions of these processes are different at different temperature ranges. We also find that the films annealed in N-2 ambient show stronger luminescent intensity than those in air ambient. (C) 2000 Elsevier Science B.V. All rights reserved.