Raman scattering evidence of medium-range order in low fluence Se+-implanted GaAs

Citation
J. Zuk et al., Raman scattering evidence of medium-range order in low fluence Se+-implanted GaAs, NUCL INST B, 168(4), 2000, pp. 521-526
Citations number
16
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
168
Issue
4
Year of publication
2000
Pages
521 - 526
Database
ISI
SICI code
0168-583X(200008)168:4<521:RSEOMO>2.0.ZU;2-5
Abstract
The effect of growing disorder in the 200 keV Set-implanted GaAs layers has been investigated by Raman scattering for low ion fluences ranging from 1 x 10(12) to 1 x 10(14) cm(-2). We observe a softening and asymmetric broade ning of the symmetry-allowed LO phonon line, and the same effect for the TO peak corresponding to the misoriented, recrystallized parts of the implant ed material. The average diameters of GaAs nanocrystals were determined usi ng a phonon-confinement model. The presence of the background signal attrib uted to a boson peak in the Raman spectra indicates that the medium-range o rder amorphous phase becomes important above the Se+ ion threshold fluence of 8 x 10(12) cm(-2). (C) 2000 Elsevier Science B,V, All rights reserved.