The effect of growing disorder in the 200 keV Set-implanted GaAs layers has
been investigated by Raman scattering for low ion fluences ranging from 1
x 10(12) to 1 x 10(14) cm(-2). We observe a softening and asymmetric broade
ning of the symmetry-allowed LO phonon line, and the same effect for the TO
peak corresponding to the misoriented, recrystallized parts of the implant
ed material. The average diameters of GaAs nanocrystals were determined usi
ng a phonon-confinement model. The presence of the background signal attrib
uted to a boson peak in the Raman spectra indicates that the medium-range o
rder amorphous phase becomes important above the Se+ ion threshold fluence
of 8 x 10(12) cm(-2). (C) 2000 Elsevier Science B,V, All rights reserved.