An approach to treating experimental reflectometry and ellipsometry data fo
r bulk samples covered by an overlayer is suggested. This approach can be u
sed for measurement of optical constants of solids, characterization of ove
rlayers, and probing the abruptness of the spatial distribution of a bulk d
ielectric function. Numerical simulation shows that in the soft-x-ray and e
xtreme-UV ranges the method can be applied for overlayers up to 3-8 nm thic
k. (C) 2000 Optical Society of America OCIS codes: 340.0340, 120.4530, 120.
2130, 120.5700.