Positron absorption studies in electrodeposited copper layers

Positron annihilation studies within the standard methods in copper layers electrodeposited on the copper substrate are presented. The main interest w as focused on the studies of the S-parameter evaluated from the annihilatio n line as a function of the thickness of the covered layer. The thickness o f the layer ranged from 5 to 250 mu m and we were interested in the fractio n of positrons absorbed in it. From that we tested two relations linking th e local and the measured positron annihilation characteristics, and the pos itrons implantation profile. The reasonable description of the experimental data was obtained when the fraction of positrons implanted in the layer wa s deduced from the exponential positrons profile aver aged over a solid ang le. The experimental studies have been performed with Na-22 and Ge-68 posit ron sources. The present considerations could be dedicated to positron stud ies of inhomogeneous solids.