The dynamics of kink motion via atom removal/deposition as a fundamental st
ep in dissolution/crystallization of solids have become directly accessible
by a novel scanning tunneling microscopy technique. Results obtained for t
he electrochemical dissolution of Cu(100) in HCl solution show pronounced l
ocal dissolution/redeposition fluctuations at the individual kinks even at
the onset of Cu dissolution with average kink propagation and reaction rate
s in the range 10(3) and 10(5) atoms s(-1), respectively. These experiments
allow one to directly measure the central kinetic properties of this elect
rochemical reaction.