Defects and the photographic process

Citation
Mt. Olm et Rs. Eachus, Defects and the photographic process, RADIAT EFF, 150(1-4), 1999, pp. 71-78
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
RADIATION EFFECTS AND DEFECTS IN SOLIDS
ISSN journal
10420150 → ACNP
Volume
150
Issue
1-4
Year of publication
1999
Pages
71 - 78
Database
ISI
SICI code
1042-0150(1999)150:1-4<71:DATPP>2.0.ZU;2-O
Abstract
The high imaging efficiency of today's color negative film depends on the u nique defect properties of silver halides. We have chosen two important def ect topics to highlight: defect-induced anisotropic crystal growth, and sha llow electron trapping at surface defects and transition metal dopant sites . High imaging efficiency depends on the ability to concentrate photoelectr ons and thereby to form a single latent image center per crystallite. This requires electron localization at a partially-charged, shallow electron tra p at the surface followed by a shallow-deep transition to a metastable atom state. Subsequent ionic and electronic trapping processes that build the l atent image occur only at this site. In some cases, doping the bulk of the microcrystal with extrinsic shallow electron traps can improve latent image formation efficiency. Electron concentration does not occur at these dopan t sites since they are not partially charged. Magnetic resonance and photo- conductivity studies of the dynamics of shallow trapping by dopants and of the shallow-deep transition at surface sites are presented.