Optical absorption edge and some shallow donor levels in LiNbO3 systems

Citation
G. Corradi et al., Optical absorption edge and some shallow donor levels in LiNbO3 systems, RADIAT EFF, 150(1-4), 1999, pp. 211-219
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
RADIATION EFFECTS AND DEFECTS IN SOLIDS
ISSN journal
10420150 → ACNP
Volume
150
Issue
1-4
Year of publication
1999
Pages
211 - 219
Database
ISI
SICI code
1042-0150(1999)150:1-4<211:OAEASS>2.0.ZU;2-J
Abstract
In LiNbO3 the position of the conduction band edge formed by Nb 4d states s trongly depends on the presence of antisite niobiums (Nb on Li site) loweri ng the band edge. Based on this property the measurement of the UV absorpti on edge can be used for determining the Li/Nb ratio in the crystal with hig h precision, especially in the near-stoichiometric region where the relativ e precision is 0.01 mol%. The same Nb states can form shallow donor levels due to nearby impurities and/or the polaron effect. Charge transfer process es between Nb5+/4+ polaron and Ti4+/3+ shallow donor levels and Jahn - Tell er effects of the involved d(1) paramagnetic states have been observed in r educed LiNbO3:Mg:Ti and are compared with literature results in LiNbO3:Ti.