Tomographic study on high-fluence impact of nitrogen into silicon

Citation
M. Muller et al., Tomographic study on high-fluence impact of nitrogen into silicon, SEMIC SCI T, 15(7), 2000, pp. 658-664
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
ISSN journal
02681242 → ACNP
Volume
15
Issue
7
Year of publication
2000
Pages
658 - 664
Database
ISI
SICI code
0268-1242(200007)15:7<658:TSOHIO>2.0.ZU;2-Z
Abstract
At present nothing is known about the way the amorphized zone in high-fluen ce nitrogen irradiated silicon distributes in three dimensions. This is exa mined here for the first time by a modified tomographic approach which enab les us to reconstruct the high-fluence implantation distribution and the gr owth of the amorphized zone in three dimensions. It turns out that the latt er does not grow isotropically, but preferentially in the forward direction , its 3D shape being cylindrical at medium fluences, and resembling that of a truncated egg at the highest fluences studied.