Liners for tungsten plug applications with long throw and ionized PVD

Authors
Butler, DC Buchanan, K Burgess, SR Urbansky, N Schmidbauer, S
Citation
Dc. Butler et al., Liners for tungsten plug applications with long throw and ionized PVD, SOL ST TECH, 43(7), 2000, pp. 183
Citations number
3
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
SOLID STATE TECHNOLOGY
ISSN journal
0038111X → ACNP
Volume
43
Issue
7
Year of publication
2000
Database
ISI
SICI code
0038-111X(200007)43:7<183:LFTPAW>2.0.ZU;2-J
Abstract
The properties of Ti contact and TiN barrier layers deposited by PVD are sh own to depend on the target-to-substrate distance. A long throw process, co mbined with low chamber pressure, extends PVD processes below 0.17 mu m des ign rules. Ionized PVD processing extends PVD capability even further.