Progress for characterization and Advanced reticle repair

The combined attributes of focused ion beam reticle repair and the quantita tive application of atomic force microscopy, the latter implemented as SNP, provide a complete solution for advanced reticle repair and characterizati on. Ion beam repair offers superior accuracy and precision in both material deposition and removal repairs-removal without significant damage to under lying or adjacent quartz. SNP can provide quantitative measurement of 3D st ructures, including those associated with alternating phase shifters etched into quartz as well as embedded shifters. These capabilities are crucial t o the performance of the advanced reticles required for subwavelength litho graphy.