In situ steam generation: A new rapid thermal oxidation technique

Authors
Kuppurao, S Joo, HS Miner, G
Citation
S. Kuppurao et al., In situ steam generation: A new rapid thermal oxidation technique, SOL ST TECH, 43(7), 2000, pp. 233
Citations number
8
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
SOLID STATE TECHNOLOGY
ISSN journal
0038111X → ACNP
Volume
43
Issue
7
Year of publication
2000
Database
ISI
SICI code
0038-111X(200007)43:7<233:ISSGAN>2.0.ZU;2-F
Abstract
In situ steam generation is a new oxidation technology for single-wafer RTP . Its process parameters can be controlled very precisely, and it provides productivity benefits compared to dry oxidation and torch-based wet oxidati on. Its suitability for ultra-thin gate oxidation and STI liner oxidation i s demonstrated.