Surface roughening in electrodeposited nickel films on ITO glasses at a low current density

Citation
M. Saitou et al., Surface roughening in electrodeposited nickel films on ITO glasses at a low current density, SURF SCI, 459(1-2), 2000, pp. L462-L466
Citations number
19
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
459
Issue
1-2
Year of publication
2000
Pages
L462 - L466
Database
ISI
SICI code
0039-6028(20000701)459:1-2<L462:SRIENF>2.0.ZU;2-4
Abstract
We have studied the kinetic surface roughening of nickel films electrodepos ited on ITO glasses at a low current density using atomic force microscopy (AFM), electron and X-ray diffraction. The AFM images of the nickel films e xhibited the scaling relations represented by the growth exponent beta = 0. 78 +/- 0.03 and the roughness exponent alpha = 0.96 +/- 0.04, which is in g ood agreement with the prediction by the diffusion-driven growth model. Ele ctron and X-ray diffraction revealed a preferred growth orientation of the electrodeposited nickel films, which gives an explanation for the growth ex ponent beta greater than 1/2. (C) 2000 Elsevier Science B.V. All rights res erved.