Influence of sample oxidation on the nature of optical luminescence from porous silicon

Citation
I. Coulthard et al., Influence of sample oxidation on the nature of optical luminescence from porous silicon, APPL PHYS L, 77(4), 2000, pp. 498-500
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
4
Year of publication
2000
Pages
498 - 500
Database
ISI
SICI code
0003-6951(20000724)77:4<498:IOSOOT>2.0.ZU;2-B
Abstract
Site-selective luminescence experiments were performed upon porous-silicon samples exposed to varying degrees of oxidation. The source of different lu minescence bands was determined to be due to either quantum confinement in nanocrystalline silicon or defective silicon oxide. Of particular interest is the defective silicon-oxide luminescence band found at 2.1 eV, which was found to frequently overlap with a luminescence band from nanocrystalline silicon. Some of the historical confusion and debate with regards to the so urce of luminescence from porous silicon can be attributed to this overlap. (C) 2000 American Institute of Physics. [S0003-6951(00)01330-9].