The effect of solvents on the morphology and properties of styrene-butadien
e-styrene (SBS, M-n = 99 575, M-w/M-n = 1.3, S/B = 3 : 7) triblock copolyme
r films was studied in this paper. The solvents used in the study are: ethy
lmethylketone, a preferential solvent for the PS block; toluene, a nonprefe
rential solvent for both the PS and the PB blocks; and mixed hexane/cyclohe
xane (2/5, in volume ratio), a preferential solvent for the PB block. The m
orphology of samples cast from solutions from different solvents and then s
tained by RuO4 was observed by TEM, Moreover, the tensile properties and de
formation recovery behavior for these samples were measured and the results
are explained according to the microstructures observed.