Thin films of mesoporous silica: preparation and characterization

Citation
S. Pevzner et al., Thin films of mesoporous silica: preparation and characterization, CURR OP COL, 4(6), 1999, pp. 420-427
Citations number
78
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CURRENT OPINION IN COLLOID & INTERFACE SCIENCE
ISSN journal
13590294 → ACNP
Volume
4
Issue
6
Year of publication
1999
Pages
420 - 427
Database
ISI
SICI code
1359-0294(199912)4:6<420:TFOMSP>2.0.ZU;2-3
Abstract
Preparation of mesoporous materials in a thin film geometry was first repor ted in 1996. Recently, improvement of the preparation methods yielded stabl e films with well-defined symmetries, controlled pore orientation, continui ty and film thickness. The ability to tailor film properties is important f or their utilization in applications ranging from catalysis to microelectro nics, where morphological control in the meso-domain is vital. (C) 2000 Els evier Science Ltd. All rights reserved.