Coulomb-enhanced Auger recombination in crystalline silicon at intermediate and high-injection densities

Citation
J. Schmidt et al., Coulomb-enhanced Auger recombination in crystalline silicon at intermediate and high-injection densities, J APPL PHYS, 88(3), 2000, pp. 1494-1497
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
88
Issue
3
Year of publication
2000
Pages
1494 - 1497
Database
ISI
SICI code
0021-8979(20000801)88:3<1494:CARICS>2.0.ZU;2-7
Abstract
Band-to-band Auger recombination in crystalline silicon is investigated by means of quasi-steady-state photoconductance measurements under intermediat e- and high-injection conditions. The measurements reveal that the correlat ion of the charge carriers via Coulombic interaction has to be taken into a ccount to accurately model the observed injection level and doping concentr ation dependence of the Auger recombination lifetime. A semi-empirical Coul omb-enhanced Auger recombination model is applied in order to simulate the experimental results theoretically. (C) 2000 American Institute of Physics. [S0021-8979(00)02415-4].