Dielectric screening effects on electron transport in Ga0.51In0.49P/InxGa1-xAs/GaAs quantum wells

Citation
C. Besikci et al., Dielectric screening effects on electron transport in Ga0.51In0.49P/InxGa1-xAs/GaAs quantum wells, J APPL PHYS, 88(3), 2000, pp. 1504-1510
Citations number
28
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
88
Issue
3
Year of publication
2000
Pages
1504 - 1510
Database
ISI
SICI code
0021-8979(20000801)88:3<1504:DSEOET>2.0.ZU;2-5
Abstract
The effects of dielectric screening on the two dimensional polar optical ph onon scattering and on electron transport in Ga0.51In0.49P/InxGa1-xAs/GaAs (x=0, 0.15, and 0.25) modulation doped heterostructures and high electron m obility transistors are investigated through the ensemble Monte Carlo techn ique. The two dimensional polar optical phonon scattering rates including a nd excluding dielectric screening effects are calculated using the self-con sistently evaluated electronic states in the quantum well. The calculated s cattering rates are compared in order to see the effects of screening on th e inter- and intra-subband scattering. Screening significantly lowers the i ntra-subband polar optical phonon scattering rates in both lattice matched and pseudomorphic structures. This results in a considerable lowering of th e critical electric field beyond which negative differential resistance is seen. Screening also modifies the dependence of transport properties on the quantum well parameters. The results of the ensemble Monte Carlo simulatio ns of high electron mobility transistors show that the performance of the d evice is considerably underestimated, if screening is not included in the c alculation of the polar optical phonon scattering rates. (C) 2000 American Institute of Physics. [S0021-8979(00)00515-6].