A detailed surface phase diagram for ZnSe MBE growth and ZnSe/GaAs(001) interface studies

Citation
D. Wolfframm et al., A detailed surface phase diagram for ZnSe MBE growth and ZnSe/GaAs(001) interface studies, J CRYST GR, 216(1-4), 2000, pp. 119-126
Citations number
25
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
216
Issue
1-4
Year of publication
2000
Pages
119 - 126
Database
ISI
SICI code
0022-0248(200007)216:1-4<119:ADSPDF>2.0.ZU;2-Z
Abstract
ZnSe epilayers have been grown on Se-induced reconstructed GaAs(0 0 1) surf aces. By varying the growth parameters such as substrate reconstruction, su bstrate temperature and atomic flux ratio, of Se to Zn, reflection high-ene rgy electron diffraction (RHEED) observations have shown the most suitable growth conditions, in particular during the initial stages of ZnSe growth. Best results were obtained when, prior to ZnSe growth, zinc was deposited f or 30s at a substrate temperature of 300 degrees C onto the Se-induced (2 x 3) reconstructed GaAs(0 0 1) surface. Remarkably the RHEED pattern did not show any evidence of a rough interface, instead there was a direct transit ion from a streaky GaAs pattern to a streaky ZnSe pattern. A detailed phase diagram concerning the common ZnSe(OO 1) surface reconstructions, i.e, the Se-rich (2 x 1) as well as Zn-rich c(2 X 2) reconstructions, was establish ed as a function of the atomic flux ratio, of Se to Zn, and the substrate t emperature. (C) 2000 Elsevier Science B.V. All rights reserved.