The incorporation mechanism of SiO2 particles into zinc electrodeposit is d
iscussed. The SiO2 particles precipitate in two ways on the (00-1)(eta) of
zinc electrodeposit: by lined up particles along the laterally growing macr
osteps on the (00.1)(eta) and by randomly dispersed particles on the (00.1)
(eta). These particles incorporate into the electrodeposits by following tw
o processes. The sidewalls of particles are incorporated into the macrostep
s at the edge of (00.1)(eta). The bottom of randomly dispersed particles ar
e incorporated into the (00.1)(eta) probably by the atomic steps. (C) 2000
The Electrochemical Society.