A quantitative model for gettering processes is presented. First, lifetime-
killing impurities that are fixed in the silicon lattice, either as precipi
tates, trapped atoms, or substitutionals, must he extracted. Then they trav
el as interstitials to a sink region where they cease to be harmful to the
electron device behavior. The model is applied to several cases where alumi
num or phosphorus gettering is performed. Agreement with experimental resul
ts commonly observed is found, and several interesting conclusions are reac
hed. Application to a more complex situation provides a way of identifying
the phenomena involved and their importance. This quantitative model is tho
ught to be a useful tool for the interpretation of gettering experiments. (
C) 2000 The Electrochemical Society.