Diagnostic of rf discharge plasma by Thomson scattering with gated intensified charge coupled device detectors

Citation
Sa. Moshkalyov et al., Diagnostic of rf discharge plasma by Thomson scattering with gated intensified charge coupled device detectors, J VAC SCI A, 18(4), 2000, pp. 1395-1400
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
18
Issue
4
Year of publication
2000
Part
1
Pages
1395 - 1400
Database
ISI
SICI code
0734-2101(200007/08)18:4<1395:DORDPB>2.0.ZU;2-1
Abstract
A Thomson scattering diagnostic, using an intensified gated charged coupled device detector and a high-repetition rate yttrium aluminum garnet laser, was utilized to measure electron parameters in a radio-frequency discharge. Both inductively and capacitively coupled plasmas in argon and argon-oxyge n mixtures were studied, with electron densities as low as similar to 5x10( 9) cm(-3). Different modes of detection (direct accumulation and photon cou nting) have been compared. The photon counting technique has been used to p rovide better accuracy at low light level (i.e., low electron densities). T he results are compared with Langmuir probe measurements performed under th e same plasma conditions, and good agreement is found between the two diagn ostics. (C) 2000 American Vacuum Society. [S0734-2101 (00)03804-5].