Quasi-two-dimensional simulation of an ion-implanted GaAs MESFET photodetector

Citation
M. Madheswaran et al., Quasi-two-dimensional simulation of an ion-implanted GaAs MESFET photodetector, MICROW OPT, 26(4), 2000, pp. 247-254
Citations number
22
Categorie Soggetti
Optics & Acoustics
Journal title
MICROWAVE AND OPTICAL TECHNOLOGY LETTERS
ISSN journal
08952477 → ACNP
Volume
26
Issue
4
Year of publication
2000
Pages
247 - 254
Database
ISI
SICI code
0895-2477(20000820)26:4<247:QSOAIG>2.0.ZU;2-H
Abstract
A quasi-two-dimensional numerical model of an optically gated GaAs metal se miconductor field-effect transistor (MESFET) has been developed for the cha racterization of the device as a photodetector The model considers the chan nel to be nonuniformly doped. The model involves the solution of a 1-D Pois son's equation, and takes into account the field-dependent mobility of the carriers in the channel for computation Of the current. It has been found t hat, in a short-channel MESFET photodetector, the drain current saturation is caused by the velocity saturation of the carriers rather than pinch off. The photocurrent gain, responsivity, and the input RC time constant of an ion-implanted GaAs MESFET having a semitransparent metal gate have been est imated rent gain. a high responsibility, and a low-input RC time constant a t an operating wavelength of 0.85 mu m. (C) 2000 John Wiley & Sons, Inc.