Fine patterning and fabrication of diamond chips with electron beam and focused-ion beam

Authors
Taniguchi, J Miyamoto, I
Citation
J. Taniguchi et I. Miyamoto, Fine patterning and fabrication of diamond chips with electron beam and focused-ion beam, NEW DIAM FR, 10(2), 2000, pp. 79-95
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
ISSN journal
13449931 → ACNP
Volume
10
Issue
2
Year of publication
2000
Pages
79 - 95
Database
ISI
SICI code
1344-9931(2000)10:2<79:FPAFOD>2.0.ZU;2-7
Abstract
The concept of electron-beam-assisted chemical etching (EBACE) and ion-beam -assisted chemical etching (IBACE), and the apparatuses for both methods ar e described. Direct fine patterning of single-crystal diamond chips using f ocused-electron-beam-assisted chemical etching and focused-ion-beam-assiste d chemical etching (FIBACE) is also described. Moreover, the fabrication of a diamond probe and a diamond field emitter tip by focused-ion-beam (FIB) etching is described.