J. Taniguchi et I. Miyamoto, Fine patterning and fabrication of diamond chips with electron beam and focused-ion beam, NEW DIAM FR, 10(2), 2000, pp. 79-95
The concept of electron-beam-assisted chemical etching (EBACE) and ion-beam
-assisted chemical etching (IBACE), and the apparatuses for both methods ar
e described. Direct fine patterning of single-crystal diamond chips using f
ocused-electron-beam-assisted chemical etching and focused-ion-beam-assiste
d chemical etching (FIBACE) is also described. Moreover, the fabrication of
a diamond probe and a diamond field emitter tip by focused-ion-beam (FIB)
etching is described.