PMMA-based resists for a spectral range near 13 nm

A number of poly(meth)acrylates positive resists of various chemical struct ures were synthesized and the sensitivity of 0.2 mu m resists films to soft X-ray radiation of a laser plasma source at a wavelength of 13 nm was inve stigated. We found that the sensitivity of methylmethacrylate (MMA) copolym ers depending on the nature of comonomers changes within the limits of 12.3 -1.7 mJ/cm(2) in a combination with the contrast gamma = 5.4-1.0. This sens itivity is higher than that of PMMA, which changes from 12 to 45 mJ/cm(2) a t the contrast gamma = 2.6-8.0 depending on the developer composition of me thylethylketone (MEK)/isopropyl alcohol (IPA). (C) 2000 Elsevier Science B. V. All rights reserved.