Interfacial wetting and percolation threshold in ultrathin Ni/C multilayerfilms

Citation
C. Borchers et al., Interfacial wetting and percolation threshold in ultrathin Ni/C multilayerfilms, PHIL MAG A, 80(7), 2000, pp. 1669-1679
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS ANDMECHANICAL PROPERTIES
ISSN journal
13642804 → ACNP
Volume
80
Issue
7
Year of publication
2000
Pages
1669 - 1679
Database
ISI
SICI code
1364-2804(200007)80:7<1669:IWAPTI>2.0.ZU;2-W
Abstract
Magnetron sputtered Ni/C graded multilayers with bilayer periods between 3. 5 and 4.5 nm are investigated by cross-sectional transmission electron micr oscopy. The multilayers consist of amorphous C layers and close packed hexa gonal Ni layers. A percolation threshold of 2.0 nm at which Ni forms coales cent layers is observed for the given deposition conditions. This percolati on threshold can be explained by island growth of Ni on amorphous C owing t o the higher surface energy of Ni compared with C, explaining the sharp dec rease in X-ray reflectivity observed for periods below 4 nm.