In this study, we have observed the roughness of the surfaces of amorphous
tantalum pentoxide (a-Ta2O5) using Atomic Force Microscopy. The elecrrolyte
-oxide-semiconductor (EOS) structure of a-Ta2O5/SiO2/p-Si/Al which was imme
rsed in the different buffer solutions (pH = 1-pH = 13) measured the capaci
tance and calculated the pH-sensitivity of a-Ta2O5 of the different reactin
g pressures. Furthermore, the relationship between the roughness of the sur
face and the pH-sensitivity of a-Ta2O5 is presented in this paper. (C) 2000
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