XPS, AES and ToF-SIMS investigation of surface films and the role of inclusions on pitting corrosion in austenitic stainless steels

Citation
A. Rossi et al., XPS, AES and ToF-SIMS investigation of surface films and the role of inclusions on pitting corrosion in austenitic stainless steels, SURF INT AN, 29(7), 2000, pp. 460-467
Citations number
27
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE AND INTERFACE ANALYSIS
ISSN journal
01422421 → ACNP
Volume
29
Issue
7
Year of publication
2000
Pages
460 - 467
Database
ISI
SICI code
0142-2421(200007)29:7<460:XAATIO>2.0.ZU;2-E
Abstract
Chemical inhomogeneities (inclusions) present in the ahoy are known to affe ct the stability of the passive film on stainless steels in the presence of chloride ions. In this work, three surface analytical techniques-XPS, AES and time-of-flight SIMS (ToF-SIMS)-have been used to characterize the surfa ce films formed on stainless steels following mechanical polishing and imme rsion in an aggressive 6% FeCl3 solution, which is utilized for testing the pitting corrosion resistance of stainless steels. Two 18Cr8Ni stainless st eels were investigated: one with a low sulphur content, DIN 1.4301 (0.003% S), and one with a high sulphur content, DIN 1.4305 (0.29% S), The XPS results show that the surface films on both steels are composed of mixed iron-chromium oxyhydroxides with a higher chromium content compared t o the bulk composition, The average passive film composition and the film t hickness remained unchanged despite increasing sulphur content in the steel after mechanical polishing. Angle-resolved XPS results suggest the presenc e of hydroxides in the outer layer of the passive film, which is confirmed by ToF-SIMS its high surface sensitivity. Auger and ToF-SIMS imaging with high lateral resolution allow the inclusion s to be characterized: sulphur and manganese maps show the power of imaging SIMS for studying the distribution of elements that are present in very lo w concentrations. It is shown that on the MnS part of the inclusions no (pr otective) oxide or hydroxide film is formed after mechanical polishing, Thi s might be the reason for the welt-documented role of these inclusions as p it initiation sites. Copyright (C) 2000 John Whey & Sons, Ltd.