Photocalcination of mesoporous silica films using vacuum ultraviolet light

Citation
A. Hozumi et al., Photocalcination of mesoporous silica films using vacuum ultraviolet light, ADVAN MATER, 12(13), 2000, pp. 985
Citations number
20
Categorie Soggetti
Multidisciplinary,"Material Science & Engineering
Journal title
ADVANCED MATERIALS
ISSN journal
09359648 → ACNP
Volume
12
Issue
13
Year of publication
2000
Database
ISI
SICI code
0935-9648(20000705)12:13<985:POMSFU>2.0.ZU;2-H
Abstract
Supramolecular assemblies of surfactant molecules are often used to synthes ize mesoporous silica (MPS). However, elimination of the surfactant molecul es by conventional thermocalcination after MPS film synthesis often leads t o film distortion or breakage. Here the effective removal of surfactant mol ecules at room temperature is described in which the hexagonal mesostructur e of the film is preserved. The technique used-photocalcination-is based on the photochemical decomposition of organic molecules under irradiation wit h vacuum ultraviolet light.