Photocalcination of mesoporous silica films using vacuum ultraviolet light
Citation
A. Hozumi et al., Photocalcination of mesoporous silica films using vacuum ultraviolet light, ADVAN MATER, 12(13), 2000, pp. 985
Categorie Soggetti
Multidisciplinary,"Material Science & Engineering
Journal title
ADVANCED MATERIALS
SICI code
0935-9648(20000705)12:13<985:POMSFU>2.0.ZU;2-H
Abstract
Supramolecular assemblies of surfactant molecules are often used to synthes
ize mesoporous silica (MPS). However, elimination of the surfactant molecul
es by conventional thermocalcination after MPS film synthesis often leads t
o film distortion or breakage. Here the effective removal of surfactant mol
ecules at room temperature is described in which the hexagonal mesostructur
e of the film is preserved. The technique used-photocalcination-is based on
the photochemical decomposition of organic molecules under irradiation wit
h vacuum ultraviolet light.