Da. Robbie et Pa. Mulheran, An investigation into the links between island patterns and the mechanismsof thin film deposition, COMP MAT SC, 17(2-4), 2000, pp. 500-504
Statistical analysis of pictures of island arrays grown on a substrate duri
ng thin-film deposition can yield useful information to the experimentalist
such as the shape of the island size distribution. We present an investiga
tion of how this type of information can in turn be used to identify the mo
st important mechanisms governing the growth process. We have used a comput
ational model based on deposition, diffusion, and aggregation (DDA) for the
following situations: (1) normal DDA where the island size distributions s
cale with coverage acid are distinguished by the critical island size; (2)
DDA plus monomer evaporation, which yields scaling island size distribution
s that lie between a powerlaw and the normal DDA results depending on the e
vaporation rate; (3) DDA with a finite probability of islands absorbing mon
omers, which yields similar distributions to case (2) but crucially does no
t display the scaling with coverage; and (4) DDA with mobile islands where
an even more dramatic departure from scaling is observed. (C) 2000 Elsevier
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