The tolerance to both ionizing dose and displacement damage of a Quasi-Self
Aligned (QSA) single polysilicon emitter bipolar technology fabricated wit
h a 0.35 mu m design rules CMOS is presented. In this work we explore the e
ffect of dose rate, high dose level irradiation and elevated temperature ir
radiation on the electrical performance of single polysilicon bipolar trans
istors. The different results are discussed and comparison with previous ar
e presented to place the technology with respect to others.