How to fabricate a defect free Si(001) surface

Authors
Hata, K Kimura, T Ozawa, S Shigekawa, H
Citation
K. Hata et al., How to fabricate a defect free Si(001) surface, J VAC SCI A, 18(4), 2000, pp. 1933-1936
Citations number
31
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
18
Issue
4
Year of publication
2000
Part
2
Pages
1933 - 1936
Database
ISI
SICI code
0734-2101(200007/08)18:4<1933:HTFADF>2.0.ZU;2-H
Abstract
We demonstrate the successful fabrication of an almost defect free Si(001) surface by refining the standard annealing and flashing surface preparation method. On any desired samples, we can routinely fabricate a surface with defect densities lower than 0.1%, significantly reducing the defect density compared to surfaces fabricated by standard methodology. (C) 2000 American Vacuum Society. [S0734-2101(00)12004-4].