Gas-phase chemistry in up-scaled plasma enhanced metal-organic chemical-vapor deposition of TiN and Ti(C,N) on tool steel

In this article, the deposition of TiN and Ti(C,N) in a relatively large sc ale reactor vessel is discussed. Tetrakis(diethylamine)titanium (TDEAT) was used for the deposition of TiN and Ti(C, N) at low temperatures. Favorable gas-phase conditions for deposition of Ti(C, N) in a pulsed direct current plasma have been determined, making use of mass and optical spectroscopy. Decomposition of TDEAT in a pure hydrogen plasma resulted in the favorable cleavage of diethylamine from the precursor but prevents the formation of T i(C, N) due to the lack of nitrogen and carbon. Addition of Nz to the hydro gen plasma results in the formation of NHx (1 less than or equal to x less than or equal to 4), opening transamination pathways. Seemingly high qualit y Ti(C,N) coatings (Hv = 1600) were deposited on WN 1.2370 tool steel. (C) 2000 American Vacuum Society. [S0734-2101(00)15004-3].