H. Sawada et K. Kawakami, First-principles calculation of the interaction between nitrogen atoms andvacancies in silicon, PHYS REV B, 62(3), 2000, pp. 1851-1858
Stability of several states of nitrogen in silicon were investigated by the
first-principles calculation. A single nitrogen at a split interstitial si
te and bond center site is more stable than that at a tetrahedral and hexag
onal site. A nitrogen pair is more stable than the single nitrogen at the s
plit interstitial site by 4.3 eV, which indicates that the nitrogen pair ex
ists even near the melting temperature of silicon. Binding energy between t
he nitrogen pair and two vacancies indicates that a complex consisting of t
he nitrogen pair and two vacancies can exist at the temperature of the void
aggregation as far as considering thermal equilibrium. Formation of the co
mplex can affect the concentration or the diffusibility of the vacancy.