The hysteresis and drift effect of hydrogenated amorphous silicon for ISFET

Citation
Jc. Chou et Cn. Hsiao, The hysteresis and drift effect of hydrogenated amorphous silicon for ISFET, SENS ACTU-B, 66(1-3), 2000, pp. 181-183
Citations number
6
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
SENSORS AND ACTUATORS B-CHEMICAL
ISSN journal
09254005 → ACNP
Volume
66
Issue
1-3
Year of publication
2000
Pages
181 - 183
Database
ISI
SICI code
0925-4005(20000725)66:1-3<181:THADEO>2.0.ZU;2-V
Abstract
According to the experimental results, the output behavior of the device co nsists of four parts: fast response, slow response, drift and hysteresis. T he hysteresis and drift limit the accuracy obtained from pH-sensitive surfa ce in ion-sensitive field-effect transistors (pH-ISFETs). In this paper, we have studied that hysteresis affects of hydrogenated amorphous silicon (a- Si:H)-gate ISFETs by exposing the device to two cycles of pH values and com pared the hysteresis amounts. In addition, we have measured the drift effec t of a-Si:H at the different pH values and understand the influence of pH v alues for the drift effects of a-Si:H-gate ISFETs. (C) 2000 Elsevier Scienc e S.A. All rights reserved.