Design and fabrication of planar guard ring termination for high-voltage SiC diodes

Citation
Dc. Sheridan et al., Design and fabrication of planar guard ring termination for high-voltage SiC diodes, SOL ST ELEC, 44(8), 2000, pp. 1367-1372
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
SOLID-STATE ELECTRONICS
ISSN journal
00381101 → ACNP
Volume
44
Issue
8
Year of publication
2000
Pages
1367 - 1372
Database
ISI
SICI code
0038-1101(200008)44:8<1367:DAFOPG>2.0.ZU;2-A
Abstract
An optimized multiple floating guard ring structure is investigated for the first time as an edge termination method for high voltage 4H-SiC planar de vices. Simulations were performed to investigate SIC guard ring termination , and determine the optimum guard ring spacing for planar diodes with up to four floating rings. Simulated optimized designs predicted breakdown value s from 40% of the ideal breakdown with a single ring, to 84% of the ideal v alue for diodes with four rings. Implanted 4H-SiC pn diodes with optimized guard ring designs were fabricated and results correlated to simulation. Ex perimental breakdown values of 1.2-1.3 kV for guard ring structure with fou r rings were in good agreement with simulated results. (C) 2000 Elsevier Sc ience Ltd. All rights reserved.