In this paper, a floating ring edge termination structure using minimally s
ized lightly doped p-rings is proposed. A novel embodiment of the structure
involves placement of shallow p(+)-regions offset from the centre of each
of the p-well rings to reduce peak electric field at the surface and to red
uce sensitivity to oxide interface charges. The structures have been fabric
ated using an advanced, 2 kV MOS-bipolar process technology. A close match
between the simulated and experimental results validates the proposed struc
ture. (C) 2000 Elsevier Science Ltd. All rights reserved.