Nanofabrication of self-assembled monolayers using scanning probe lithography

This Account focuses on our recent and systematic effort in the development of generic scanning probe lithography (SPL)-based methodologies to produce nanopatterns of self-assembled mono-layers (SAMs). The key to achieving hi gh spatial precision is to keep the tip-surface interactions strong and loc al. The approaches used include two AFM-based methods, nanoshaving and nano grafting, which rely on the local force, and two STM-based techniques, elec tron-induced diffusion and desorption, which use tunneling electrons for fa brication. In this Account we discuss the principle of these procedures and the critical steps in controlling local tip-surface interactions. The adva ntages of SPL will be illustrated through various examples of production an d modification of SAM nanopatterns and their potential applications.