Multi-wavelength excimer ultraviolet sources from a mixture of krypton andiodine in a dielectric barrier discharge

Citation
Jy. Zhang et Iw. Boyd, Multi-wavelength excimer ultraviolet sources from a mixture of krypton andiodine in a dielectric barrier discharge, APP PHYS B, 71(2), 2000, pp. 177-179
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS B-LASERS AND OPTICS
ISSN journal
09462171 → ACNP
Volume
71
Issue
2
Year of publication
2000
Pages
177 - 179
Database
ISI
SICI code
0946-2171(200008)71:2<177:MEUSFA>2.0.ZU;2-I
Abstract
New ultraviolet (UV) sources (excimer lamps) have been demonstrated using m ixtures of krypton and iodine in a high-pressure dielectric barrier dischar ge to provide intense multi-wavelength radiation at lambda = 183 nm (atomic iodine line, P-4(5/2) --> P-2(3/2)) 191 nm (KrI*, B-1/2 --> X-1/2), 206 nm (atomic iodine line, P-2(3/2) --> P-2(1/2)), and 342 nm (I-2*, D-1/2 --> X -1/2) The characteristics of the optical emission spectra of the atomic spe cies and the excited dimers (excimers) formed for different total gas press ures and in the presence of a buffer gas have been investigated. The highes t intensity, at 183 nm, is obtained at pressures up to 1 bar while the over all emission spectra can be controlled by adjusting the total pressure. The results show that these strong multiwavelength lamps offer an interesting alternative to conventional UV sources.