Jy. Zhang et Iw. Boyd, Multi-wavelength excimer ultraviolet sources from a mixture of krypton andiodine in a dielectric barrier discharge, APP PHYS B, 71(2), 2000, pp. 177-179
New ultraviolet (UV) sources (excimer lamps) have been demonstrated using m
ixtures of krypton and iodine in a high-pressure dielectric barrier dischar
ge to provide intense multi-wavelength radiation at lambda = 183 nm (atomic
iodine line, P-4(5/2) --> P-2(3/2)) 191 nm (KrI*, B-1/2 --> X-1/2), 206 nm
(atomic iodine line, P-2(3/2) --> P-2(1/2)), and 342 nm (I-2*, D-1/2 --> X
-1/2) The characteristics of the optical emission spectra of the atomic spe
cies and the excited dimers (excimers) formed for different total gas press
ures and in the presence of a buffer gas have been investigated. The highes
t intensity, at 183 nm, is obtained at pressures up to 1 bar while the over
all emission spectra can be controlled by adjusting the total pressure. The
results show that these strong multiwavelength lamps offer an interesting
alternative to conventional UV sources.