Optically thin palladium films on silicon-based substrates and nanostructure formation: effects of hydrogen

Citation
A. Othonos et al., Optically thin palladium films on silicon-based substrates and nanostructure formation: effects of hydrogen, APPL SURF S, 161(1-2), 2000, pp. 54-60
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
161
Issue
1-2
Year of publication
2000
Pages
54 - 60
Database
ISI
SICI code
0169-4332(200007)161:1-2<54:OTPFOS>2.0.ZU;2-I
Abstract
Optically thin palladium films evaporated on different silicon-based substr ates are investigated following exposure to different concentrations of hyd rogen gas in air. Laser modulated reflectance off the palladium surface of silicon oxide, silicon nitrite and polycrystalline silicon substrates is us ed to recover information regarding changes in optical properties of the sa mples due to the absorption of hydrogen. Simple index of refraction argumen ts are sufficient to explain the results. Structural changes of the palladi um films have been investigated using atomic force microscopy before and af ter hydrogen exposure. An interesting nanostructure formation is evident in some of the samples, leading to a possible means of fabricating nanodevice s. (C) 2000 Elsevier Science B.V. All rights reserved.