Dependence of the radiative recombination lifetime upon electric field in silicon quantum dots embedded into SiO2

Citation
T. Ouisse et Ag. Nassiopoulou, Dependence of the radiative recombination lifetime upon electric field in silicon quantum dots embedded into SiO2, EUROPH LETT, 51(2), 2000, pp. 168-173
Citations number
19
Categorie Soggetti
Physics
Journal title
EUROPHYSICS LETTERS
ISSN journal
02955075 → ACNP
Volume
51
Issue
2
Year of publication
2000
Pages
168 - 173
Database
ISI
SICI code
0295-5075(200007)51:2<168:DOTRRL>2.0.ZU;2-B
Abstract
The influence of the electric field on the radiative recombination of an el ectron-hole pair in a silicon quantum dot is assessed by means of a variati onal calculation. In contrast with III-V devices, in the case of silicon th e use of SiO2 as a matrix makes possible the application of very large elec tric fields, which should indeed have a considerable impact on the radiatio n lifetime. For a distribution of crystallites. a growing electric field sh ould lead to a quenching of the radiative recombination in the larger dots and to a noticeable shift of the spectrum.