Current-voltage characteristics with a step structure of metal/polyimide/rhodamine-dendrimer/polyimide/metal junction

Citation
Y. Noguchi et al., Current-voltage characteristics with a step structure of metal/polyimide/rhodamine-dendrimer/polyimide/metal junction, IEICE TR EL, E83C(7), 2000, pp. 1076-1080
Citations number
29
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEICE TRANSACTIONS ON ELECTRONICS
ISSN journal
09168524 → ACNP
Volume
E83C
Issue
7
Year of publication
2000
Pages
1076 - 1080
Database
ISI
SICI code
0916-8524(200007)E83C:7<1076:CCWASS>2.0.ZU;2-F
Abstract
we examined the current-voltage (I-V) characteristic of metal/polyimide/rho damine-dendorimer/metal junctions prepared by the Langmuir-Blodgett (LB) te chnique. At a temperature of 32.8 K, a step structure was observed in the I -V characteristic, whereas it was not observed for the junctions without rh odamine-dendorimer. The step structure was very similar to that seen in so- called Coulomb staircase. On the basis of the model of Coulomb blockade, th e possibility of single electron tunneling via rhodamine-dendrimer (Rh-G2) molecule as a quantum dot was discussed.