The concentration behavior of the anomalous hall effect in granulated Fe/SiO2 films in the percolation transition region

Citation
Dy. Kovalev et al., The concentration behavior of the anomalous hall effect in granulated Fe/SiO2 films in the percolation transition region, J COMMUN T, 45(7), 2000, pp. 769-772
Citations number
16
Categorie Soggetti
Information Tecnology & Communication Systems
Journal title
JOURNAL OF COMMUNICATIONS TECHNOLOGY AND ELECTRONICS
ISSN journal
10642269 → ACNP
Volume
45
Issue
7
Year of publication
2000
Pages
769 - 772
Database
ISI
SICI code
1064-2269(200007)45:7<769:TCBOTA>2.0.ZU;2-J
Abstract
The Hall effect is investigated in composite films prepared on the basis of nanogranules of iron in a dielectric matrix of SiO2 below the percolation threshold. The behavior of the Hall effect is studied in the vicinity of pe rcolation transition with decreasing metal content. It is found that the de crease in the Hall field on approaching the transition on the metal side is nonmonotonic, namely, it is accompanied by the emergence of a minimum. A q ualitative model of concentration behavior of the Hall effect is suggested, which is based on the notions of singularities of the conductivity of two- phase systems in the vicinity of the percolation threshold.