Ns. Xu et al., Study of field electron emission from nanocrystalline diamond thin films grown from a N-2/CH4 microwave plasma, J PHYS D, 33(13), 2000, pp. 1572-1575
Nitrogen containing nanocrystalline diamond films have been synthesized by
microwave plasma enhanced chemical vapour deposition using N-2/CH4 as the r
eactant gas. The films prepared under different N-2/CH4 flow ratios were st
udied by scanning electron microscopy, transmission electron microscopy, x-
ray diffraction and secondary ion mass spectroscopy. Their field emission c
haracteristics, i.e. both the distribution of the emission sites and curren
t-voltage characteristics, were recorded using a transparent anode techniqu
e. It was found that the grain size of films prepared under different condi
tions varies and has a relationship with their turn-on fields. A possible e
xplanation is given, which proposes that nanocrystalline boundary induced d
efect states might affect the field emission characteristics.