Electron-beam exposure of self-assembled monolayers of 10-undecenoic acid

Tapping mode atomic force microscopy and capacitance versus voltage measure ments were employed to study the effects of electron-beam exposure on self- assembled monolayers of 10-undecenoic acid. It was established that exposur e increases chemical/mechanical stability, resulting in a thicker layer fol lowing a solvent treatment designed to remove residual monomers. Electron e xposure also reduces the effects of pinholes in the monolayer, thereby impr oving dielectric quality. (C) 2000 Academic Press.