Surface and interface microstructural properties of Ru thin films grown onInSb (111) substrates at room temperature

Citation
Tw. Kim et al., Surface and interface microstructural properties of Ru thin films grown onInSb (111) substrates at room temperature, APPL SURF S, 161(3-4), 2000, pp. 452-458
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
161
Issue
3-4
Year of publication
2000
Pages
452 - 458
Database
ISI
SICI code
0169-4332(200007)161:3-4<452:SAIMPO>2.0.ZU;2-G
Abstract
Ru thin films were grown on p-InSb (111) substrates by the ion-beam-assiste d deposition method with the goal of producing a new kind of Ru/InSb hetero structures with high-quality heterointerfaces. Atomic force microscopy (AFM ) and X-ray diffraction (XRD) measurements showed that the Ru films grown o n InSb substrates at room temperature were polycrystalline thin layers with very smooth surfaces. Auger electron spectroscopy (AES) and Rutherford bac kscattering measurements (RBS) showed that the composition of the as-grown film was Ru and that the Ru/InSb heterointerface had relatively sharp inter faces. Transmission electron microscopy (TEM) and selected area electron-di ffraction measurements showed that the grown Ru film was a polycrystalline layer with small grain size. These results indicate that the Ru layer grown on p-InSb (111) can be used for stable contacts and metal electrodes with low resistivities in electronic devices such as metal-semiconductor field-e ffect-transistors and memory capacitor between electrodes based on InSb sub strates. (C) 2000 Elsevier Science B.V. All rights reserved.