We investigated the interface reaction between Ni (film) and 3C-SiC (substr
ate) after heat treatment by soft X-ray emission spectroscopy (SXES). Si at
oms were found to react with Ni atoms at the interface by heat treatment at
600-800 degrees C. The reacted product was identified as Ni2Si. Carbon ato
ms are concluded to be in a graphite-like state in the reacted film from th
e spectral shape of the CKalpha. Those carbon atoms were found to be distri
buted around the interface region. (C) 2000 Elsevier Science B.V. All right
s reserved.