M. Takeguchi et al., In situ UHV-TEM observation of the direct formation of Pd2Si islands on Si(111) surfaces at high temperature, APPL SURF S, 159, 2000, pp. 225-230
Pd was deposited on clean Si surfaces at about 680 K in an ultrahigh-vacuum
transmission electron microscope. The direct formation process of Pd,Si is
lands on Si(lll) surfaces was observed in situ by high-resolution transmiss
ion electron microscopy in a cross-sectional view, At a low deposition amou
nt, Si(111) 7 x 7 surfaces were transformed to a new layer due to the cover
age by Pd. With further deposition, Pd,Si islands appeared on Si surfaces.
Some Pd,Si islands were single crystals and grew epitaxially on Si(lll) sur
faces in the Stranski-Krastanow mode. After stopping Pd deposition, the sur
face of the Pd,Si islands exhibited a reconstruction structure with threefo
ld periodicity, which consists of two atomic layers. (C) 2000 Elsevier Scie
nce B.V. All rights reserved.