Quantum chemical mechanism in parasitic reaction of AlGaN alloys formation

Citation
O. Makino et al., Quantum chemical mechanism in parasitic reaction of AlGaN alloys formation, APPL SURF S, 159, 2000, pp. 374-379
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
159
Year of publication
2000
Pages
374 - 379
Database
ISI
SICI code
0169-4332(200006)159:<374:QCMIPR>2.0.ZU;2-7
Abstract
The mechanism of parasitic reactions among trimethylaluminum (TMA), trimeth ylgallium (TMG), and NH3 in atmospheric pressure (AP) MOVPE for growth of A lGaN is theoretically studied using the quantum chemical method. The calcul ations show that metal-nitrogen chain growth reaction easily proceeds throu gh the successive reactions of 'complex formation with NH3' and 'CH4 elimin ation by the bimolecular mechanism'. Additionally, a parasitic reaction in APMOVPE using other raw material is also investigated. The calculated resul t shows that small change of raw material raises activation energy of paras itic reaction, and, thus, the parasitic reaction is suppressed. This result suggests a way to improve APMOVPE by a suitable choice of substituent. (C) 2000 Elsevier Science B.V. All rights reserved. PACS: 81.10.Aj, 31.15.Ar; 82.30.Eh.